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LITHOGRAPHY:
Resist, Optical Lithography, Mask Aligners, Alignment, Resolution Limit, Minimum Feature Size, Light Sources, Optical Proximity Correction
MASKS:
Optical Masks, Electron Masks
METALLIZATION AND ETCHING:
Use of Metals in Microelectronics, Methods for Deposition - Thermal Evaporation, Sputtering, Chemical Vapour Deposition, Etching - Wet etching, Dry etching
CONTACTS – OHMIC AND SCHOTTKY:
Silicides Vs Metals, Failure – Electromigration, Wire Bonding, Packaging
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1. “Fundamentals of Modern VLSI devices”, Y. Taur and T.H. Ning, CUP, 1998.
2. “Microfabrication”, S. Franssila, John Wiley and Sons, 2004.
3. “ULSI Devices”, C.Y. Chang and S.M. Sze (Editors), John Wiley & Sons, 2000.
4. “Fundamental Principles of Optical Lithography: The Science of Microfabrication” , John Wiley & Sons, 2007.
5. “Photolithography: Basics of Microstructuring”, Christian Koch, Titus J. Rinke, MicroChemicals GmbH; 2017
6. Manual of MJB4 Mask Aligner (available online). 
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